Equipment
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Clean room (class 10000)
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Wet station
SDR & Texturing & cleaning for Si wafer(156 mm x 156mm)
Atomic Layer Deposition for Al2O3 passivation
Atomic Layer Deposition for HfO2
Atomic Layer Deposition for TCO(AZO)
Atomic Layer Deposition for CIGS Buffer layer (ZnS, ZnOH)
Plasema-enhanced Atomic layer deposition (metal)
Powder coating ALD
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PECVD systems
ICP PECVD for SiNx:H & SiO2 & a-Si:H
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RTA
Rapid Thermal Annealing for thermal treatment & thin oxidation
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Diffusion furnaces
Doping furnace for PoCl3 & BBr3(156 mm x 156mm)
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Refractometer
Thin film thickness measurement system
Thickness, Refractive index, Reflectance for textured Si wafer
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Sinton WCT-120 Sun-Voc
Lifetime measurement(QSSPC)
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Ellipsometer
SENTECH 단파장 엘립소미터
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4-point prober
Sheet resistance for textured Si wafer & TCO layer
